MFT 214 - Lithography for Nanofabrication
Credits: 3
2 Lecture Hours 2 Lab Hours
Prerequisites: MFT 211 MFT 212
Co-requisites: MFT 213
This course covers all aspects of lithography from design and mask fabrication to pattern transfer and inspection. The course is divided into three major sections. The first section describes the lithographic process from substrate preparation to exposure. Students learn the nature and behavior of photoresist materials. The second section examines the process from development through inspection, introducing optical masks, aligners, steppers and scanners. In addition, critical dimension control and profile control of photoresists is investigated. The last section discusses advanced optical lithographic techniques such as phase shifting masks and illumination schemes, e-beams, x-ray, EUV and ion beam lithography.
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