MFT 214 - Lithography for Nanofabrication

1. Describe the theory and operation of positive i-line contact and proximity photolithography.
2. Use reflective spectroscopy and profilometry.
3. Create a template using negative photolithography on a silicon wafer and use the template to create a molded structure in Polydimethylsiloxane (PDMS).
4. Print a quantum dot functionalized alkanethiol self-assembled monolayer (SAM) onto a deposited film.
5. Utilize photolithography, microscopy, profilometry, wet and dry etch skills in the use of the photolithography equipment for multi-level alignment.
6. Characterize e-beam lithography samples using Atomic Force Microscopy (AFM) and Scanning Electron Microscopy (SEM).
7. Use Field Emission Scanning Electron Microscopy (FESEM) images to compare to student SEM images.
8. Use the stamp embossing equipment to imprint a pattern into a photo resist.
9. Create block co-polymer fin and/or column patterns.

1. Resists
2. Masks
3. Developing
4. Optical lithography
5. E-beam lithography
6. Probe lithography
7. Imprinting lithography
8. Step and flash lithography
9. Pen dip lithography
10. Stamp lithography
11. Lithography and etching for patterning
12. Lithography and lift-off for patterning
13. Lithography and self-assembly for patterning

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