MFT 216 - Char/Test Nanotech Structures/Materials Credits: 3 2 Lecture Hours 2 Lab Hours Prerequisites: MFT 211 MFT 212 Co-requisites: MFT 215
This course examines a variety of measurements and techniques essential for controlling micro and nanofabrication processes. Monitoring techniques such as residual gas analysis, optical emission spectroscopy and end point detection are discussed. Characterization techniques such as scanning electron microscopy x-ray photoelectron spectroscopy, atomic probe methods, optical thin film measurements and resistivity/conductivity measurements are introduced. Basic measurements for yield analysis and process control are stressed.
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