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Jul 05, 2025
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MFT 214 - Lithography for Nanofabrication
Credits: 3
2 Lecture Hours 2 Lab Hours
Prerequisites: MFT 211 , MFT 212
Co-requisites: MFT 213
Description
This course covers all aspects of lithography from design and mask fabrication to pattern transfer and inspection. The course is divided into three major sections. The first section describes the lithographic process from substrate preparation to exposure. Students learn the nature and behavior of photoresist materials. The second section examines the process from development through inspection, introducing optical masks, aligners, steppers and scanners. In addition, critical dimension control and profile control of photoresists is investigated. The last section covers advanced optical lithographic techniques such as phase shifting masks and illumination schemes, e-beams, x-ray, extreme ultraviolet (EUV) and ion beam lithography.
Learning Outcomes
Upon successful completion of the course, the student will:
- Describe the theory and operation of positive i-line contact and proximity photolithography.
- Use reflective spectroscopy and profilometry to characterize the surface of a silicon wafer.
- Create a template using negative photolithography on a silicon wafer and use the template to create a molded structure in Polydimethylsiloxane (PDMS).
- Print a quantum dot functionalized alkanethiol self-assembled monolayer (SAM) onto a deposited film.
- Utilize photolithography, microscopy, profilometry, wet and dry etching skills and appropriate equipment for multi-level alignment.
- Characterize e-beam lithography samples using Atomic Force Microscopy (AFM) and Scanning Electron Microscopy (SEM).
- Apply Field Emission Scanning Electron Microscopy (FESEM) images to obtain images at higher magnifications.
- Apply the stamp embossing equipment to imprint a pattern into a photo resist.
- Create block co-polymer fin and/or column patterns.
Listed Topics
- Resists
- Masks
- Developing
- Optical lithography
- E-beam lithography
- Probe lithography
- Imprinting lithography
- Step and flash lithography
- Pen dip lithography
- Stamp lithography
- Lithography and etching for patterning
- Lithography and lift-off for patterning
- Lithography and self-assembly for patterning
Reference Materials
Instructor-approved textbook and materials.
Students who successfully complete this course acquire general knowledge, skills and abilities that align with CCAC’s definition of an educated person. Specifically, this course fulfills these General Education Goals: - Critical Thinking & Problem Solving
- Technological Competence
Approved By: Dr. Quintin B. Bullock Date Approved: 04/12/2024
Last Reviewed: 04/12/2024
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